Bis(dimethylamino)dimethylsilane is used in the chemical vapor deposition of silicon nitride films, and also the atomic layer deposition of SiNxCy dielectric sealing layers using plasma-enhanced atomic layer deposition (PE-ALD). It is also used as a reagent for silylation.
Bis(dimethylamino)-dimethyl silane has been used to silanize pH-sensitive microelectrodes, used to measure the membrane potential in oocytes, in an experimental procedure aimed towards cloning and characterizing human electrogenic Na+-cotransporter isoform (hhNBC). It is also used for microelectrode measurements, in a study conducted to measure carbon dioxide transport through membranes. It is also used in electronic film deposition.
