yellowish brown crystal(s); fcc, a=0.4518nm; most refractory of all known metal nitrides; hardness 1640kgf/mm2; electrical resistivity 33μohm· cm; can be prepared by heating Hf in N2 or NH3 atmospheric at 1000°C–1500°C; as a 99.5% pure material, used as a sputtering target to increase electrical stability of diodes, transistors, and integrated circuits [KIR80] [KIR81] [HAW93] [CER91]
Hafnium nitride is formed as yellow-brown, cubic crystals
and is prepared by heating hafnium metal to 1000–1500 C
in an atmosphere of nitrogen or ammonia. It can also be
prepared by reacting hafnium tetrachloride vapor with nitrogen
in a hydrogen atmosphere at temperatures higher than
1000 C.
Hafnium nitride is a brittle solid. The deposition of a thin
layer of hafnium nitride on steel grade, cemented carbide,
cutting tools reduces frictional forces and wear, thus increasing
the life of the tool by a factor of 6–8.
Most refractory of all nitrides.
