High-purity triethylgallium and other organometallic compounds are the most important and widely used raw materials for growing optoelectronic materials in metal-organic chemical vapor deposition (MOCVD) and chemical beam epitaxy (CBE), and are widely used in growing compound semiconductor thin film materials such as indium gallium arsenide nitride (InGaAsN), indium gallium arsenide (InGaAs), and indium gallium phosphide (InGaP).
Triethyl gallium is monomer in vapor and burns in air with a violent flame. Triethyl gallium is soluble in organic solvents such as ether and benzene, and decomposes rapidly in cold water to produce diethyl gallium hydroxide and ethane.
