Tetravinylsilane is a useful research chemical compound.
Tetravinylsilane (TVS) could be used to deposit hydrogenated amorphous silicon carbide (a-SiC: H) films to study the influence of RF (13.56 MHz) pulsed plasma on the double bond. It can also be used as a monomer for the deposition of pp-TVS films[1-2].
Flammability and Explosibility
Flammable
[1] V. Cech. “Physico-chemical properties of plasma-polymerized tetravinylsilane.” Surface & Coatings Technology 201 1 (2007): 5512–5517.
[2] V. Cech. “Influence of Oxygen on the Chemical Structure of Plasma Polymer Films Deposited from a Mixture of Tetravinylsilane and Oxygen Gas.” Plasma Processes and Polymers 52 2 (2007).
