タングステン(IV)ジスルフィド

危険有害性情報のコード(GHS)

• 絵表示(GHS)

  

• 注意喚起語

  Warning

• 危険有害性情報

  H315：皮膚刺激

  H319：強い眼刺激

  H335：呼吸器への刺激のおそれ

• 注意書き

  P261：粉じん/煙/ガス/ミスト/蒸気/スプレーの吸入を避ける こと。

  P305+P351+P338：眼に入った場合：水で数分間注意深く洗うこと。次にコ ンタクトレンズを着用していて容易に外せる場合は外す こと。その後も洗浄を続けること。

タングステン(IV)ジスルフィド 価格

タングステン(IV)ジスルフィド 化学特性,用途語,生産方法

• 説明

  Few-layer?tungsten disulfide (WS2) film has a 2D-layered structure with a narrow indirect bandgap of of 1.35 eV. In contrast, the monolayer film possesses a direct bandgap of 2.1 eV.

• 製造方法

  Synthetic?- Chemical Vapour Transport (CVT)

• 主な応用

  Due to its distinctive electron configuration and high specific surface area, few-layer tungsten disulfide nanosheets have potential applications in electrodes and energy storage devices, supercapacitors, and photoelectrochemical cells as a catalyst for hydrogen evolution reactions (HERs). With?tunable electromagnetic absorption, it has practical applications?against electromagnetic pollution. WS₂?is also a great potential candidate in photothermal therapy for the ablation of cancer cells, when NIR light is absorbed and converted into heat.

• 化学的特性

  Grayish-black solid. Mp above 1480C, can lubricate at temperatures above 2400F (1316C). Attacked by fluorine and hot sulfuric and hydrogen fluoride.

• 使用

  Tungsten sulfide is used as a component of catalysts for hydrotreating of crude oil, hydrodesulfurization and hydrodenitrification reactions. It finds application as solid-state secondary lithium battery cathodes and other electrochemical devices. It is found that it forms inorganic nanotubes, which is better reinforcing agents than carbon nanotubes. Tungsten sulfide addition to epoxy resin improves adhesion, fracture toughness and strain energy release rate.

タングステン(IV)ジスルフィド 上流と下流の製品情報

タングステン(IV)ジスルフィド 生産企業

Global(215)Suppliers

タングステン(IV)ジスルフィド スペクトルデータ(IR1)

12138-09-9, タングステン(IV)ジスルフィド キーワード