Description
Tantalum ethoxide can be used for the manufacture of tantalum (V) oxidethin-film materials using chemical vapor deposition, atomic layer deposition, and sol-gel processing. Those materials have applications in semiconductor, electrochromic and optical fields
1,2,3. In research filed, it can be used for the synthesis of some novel compounds such as oxo-alkoxide-carboxylates like Ta4O4(OEt)8(OOCCH3)4 with special molecular structure
2. It is also used to prepare tantalum oxide nanoparticles for the imaging cartilage
4.
Reference
- Sukanya Murali, †, A. Anand Deshpande, and C. G. Takoudis. "Modeling of the Metalorganic Chemical Vapor Deposition of Tantalum Oxide from Tantalum Ethoxide and Oxygen." Industrial & Engineering Chemistry Research 44.16(2005): págs. 6387-6392.
- Dong, L. U., et al. "Synthesis Method and Application of Tantalum (Ⅴ) Ethoxide" Guangzhou Chemical Industry (2016).
- https://www.alfa.com/en/catalog/014643/
Chemical Properties
clear colorless to almost colorless liquid or
Uses
Tantalum(V) ethoxide acts as a precursor used in the preparation of ultra thin films of tantalum oxide and other tantalum containing films, which finds application in semiconductors. It is also used to prepare tantalum oxide nanoparticles for the imaging cartilage.
Uses
Tantalum(V) ethoxide precursor is used to deposit ultra thin films of Tantalum oxide and other tantalum containing films by atomic layer deposition and chemical vapor deposition methods
General Description
Tantalum(V) ethoxide Ta(OC
2H
5)
5 is a tantalum alkoxide that can be used as a precursor in the preparation of tantalum oxide by chemical vapor deposition (CVD). It has excellent volatility and thermal stability. It can be synthesized by anodic oxidation of tantalum plate in anhydrous ethanol.
Purification Methods
Purify it by distillation under reduced pressure. It aggregates in *C6H6,EtOH, MeCN, pyridine and diisopropyl ether. [Bradley et al. J Chem Soc 726 1955, Bradley et al. J Chem Soc 5 1956, Beilstein 1 IV 1312.]
