N-(Dimethylsilyl)-1,1-dimethylsilylamin

Bezeichnung:N-(Dimethylsilyl)-1,1-dimethylsilylamin

CAS-Nr15933-59-2

Englisch Name:1,1,3,3-Tetramethyldisilazane

CBNumberCB7776616

SummenformelC4H15NSi2

Molgewicht133.34

MOL-Datei15933-59-2.mol

Synonyma

N-(Dimethylsilyl)-1,1-dimethylsilylamin

N-(Dimethylsilyl)-1,1-dimethylsilylamin physikalisch-chemischer Eigenschaften

Schmelzpunkt	99-100 °C
Siedepunkt	99-100 °C
Dichte	0.752 g/mL at 25 °C(lit.)
Brechungsindex	n20/D 1.404(lit.)
Flammpunkt	17 °F
storage temp.	Store below +30°C.
Löslichkeit	Miscible with common organic solvents.
pka	9.80±0.70(Predicted)
Aggregatzustand	clear liquid
Farbe	Colorless to Almost colorless
Wichte	0.752
Hydrolytic Sensitivity	7: reacts slowly with moisture/water
Sensitive	Moisture Sensitive
BRN	741869
CAS Datenbank	15933-59-2(CAS DataBase Reference)
EPA chemische Informationen	Silanamine, N-(dimethylsilyl)-1,1-dimethyl- (15933-59-2)

Sicherheit

Kennzeichnung gefährlicher	F,Xi
R-Sätze:	11-36/37/38
S-Sätze:	16-26-36
RIDADR	UN 2924 3/PG 2
WGK Germany	3
F	10-21
TSCA	Yes
HazardClass	3
PackingGroup	II
HS Code	29319090

Gefahreninformationscode (GHS)

1,1,3,3-Tetramethyldisilazane Chemische Eigenschaften,Einsatz,Produktion Methoden

R-Sätze Betriebsanweisung:
R11:Leichtentzündlich.
R36/37/38:Reizt die Augen, die Atmungsorgane und die Haut.
S-Sätze Betriebsanweisung:
S16:Von Zündquellen fernhalten - Nicht rauchen.
S26:Bei Berührung mit den Augen sofort gründlich mit Wasser abspülen und Arzt konsultieren.
S36:DE: Bei der Arbeit geeignete Schutzkleidung tragen.
Chemische Eigenschaften
Clear colorless to faintly yellow liquid
Physikalische Eigenschaften
bp 99–100 °C; n20 D 1.4040; d 0.752 g cm?3.
Verwenden
Tetramethyldisilazane is used as a gas chromatographic derivatizing reagent. Further, it reacts with phenol to prepare dimethylphenoxysilane. In addition, it is used in electronic, polymer and pharmaceutical industries.
Verwenden
1,1,3,3-Tetramethyldisilazane is widely used in intramolecular hydrosilation of allyl alcohols, homoallyl alcohols, and homopropargyl alcohols for the regio- and stereoselective synthesis of polyols
Properties and Applications
The ICP CVD synthesis of SiCxNy: H thin films using 1,1,3,3-tetramethyldisilazane (TMDSZ ) as a single-source precursor and argon as a gas-activator[1]. Using TMDSZ as the single-source compound produced amorphous hydrogenated silicon carbonitride (a-SiCN: H) films, whereas no such films were formed when HMDSZ was used, which was attributed to the lack of Si–H bond in HMDSZ. Under the collision-free condition, the formation of ?CH3, NH3, and DMSA was demonstrated from the decomposition of TMDSZ on the heated W filament. Free-radical short-chain reactions dominate the secondary gas-phase reactions of TMDSZ in the reactor setup. The short-chain reaction is initiated by the formation of methyl radicals via the cleavage of the Si–CH3 bonds of TMDSZ. The H abstraction by the produced methyl radicals from the Si–H or the C–H bond in various stable molecules (e.g., TMDSZ) propagates the chain with a resulting radical, which recombines with another radical to terminate the chain reactions, producing a series of products in the high-mass region[2].
Einzelnachweise
[1] Maksim N. Chagin. “Synthesis, Properties and Aging of ICP-CVD SiCxNy:H Films Formed from Tetramethyldisilazane.” Coatings (2022).
[2] James Michael Stevenson, Eric Ampong and Yujun Shi*. “Understanding the Reaction Chemistry of 1,1,3,3-Tetramethyldisilazane as a Precursor Gas in a Catalytic Chemical Vapor Deposition Process.” The Journal of Physical Chemistry A 127 44 (2023): 9185–9195.

N-(Dimethylsilyl)-1,1-dimethylsilylamin Anbieter Lieferant Produzent Hersteller Vertrieb Händler.

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