Hexachlordisilan

Bezeichnung:Hexachlordisilan

CAS-Nr13465-77-5

Englisch Name:Hexachlorodisilane

CBNumberCB7433595

SummenformelCl6Si2

Molgewicht268.89

MOL-Datei13465-77-5.mol

Synonyma

Hexachlordisilan

Hexachlordisilan physikalisch-chemischer Eigenschaften

Schmelzpunkt	<0°C
Siedepunkt	144-145.5 °C (lit.)
Dichte	1.562 g/mL at 25 °C (lit.)
Dampfdruck	2.8hPa at 25℃
Brechungsindex	n20/D 1.475(lit.)
Flammpunkt	78°C
storage temp.	below 5° C
Löslichkeit	sol CHCl3, CH2Cl2, benzene, THF; reacts violently, producing toxic fumes, with H2O, alcohols.
Aggregatzustand	liquid
Farbe	Colorless to Almost colorless
Wichte	1.562
Hydrolytic Sensitivity	8: reacts rapidly with moisture, water, protic solvents
Stabilität	Stable, but reacts violently with water. Moisture sensitive. May be shock sensitive. Incompatible with water, moisture, acids, strong bases, oxidizing agents, alcohols.
InChI	1S/Cl6Si2/c1-7(2,3)8(4,5)6
InChIKey	LXEXBJXDGVGRAR-UHFFFAOYSA-N
SMILES	Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl
CAS Datenbank	13465-77-5(CAS DataBase Reference)
EPA chemische Informationen	Disilane, hexachloro- (13465-77-5)

Sicherheit

Kennzeichnung gefährlicher	C
R-Sätze:	14-34
S-Sätze:	26-36/37/39-45
RIDADR	UN 2987 8/PG 2
WGK Germany	3
F	3-10-21
TSCA	TSCA listed
HazardClass	8
PackingGroup	II
HS Code	28121049
Speicherklasse	8A - Combustible corrosive hazardous materials
Hazard Classifications	Skin Corr. 1B

Gefahreninformationscode (GHS)

Hexachlorodisilane Chemische Eigenschaften,Einsatz,Produktion Methoden

R-Sätze Betriebsanweisung:
R14:Reagiert heftig mit Wasser.
R34:Verursacht Verätzungen.
S-Sätze Betriebsanweisung:
S26:Bei Berührung mit den Augen sofort gründlich mit Wasser abspülen und Arzt konsultieren.
S36/37/39:Bei der Arbeit geeignete Schutzkleidung,Schutzhandschuhe und Schutzbrille/Gesichtsschutz tragen.
S45:Bei Unfall oder Unwohlsein sofort Arzt zuziehen (wenn möglich, dieses Etikett vorzeigen).
Chemische Eigenschaften
Hexachlorodisilane is a colourless liquid, it is highly sensitive to moisture, and when exposed to air or water, it readily reacts, making it essential to handle the compound in a controlled, moisture-free environment.
Physikalische Eigenschaften
bp 144–145.5 °C; d 1.562 g/cm3.
Verwenden
Hexachlorodisilane can be used in deoxygenation and desulfurization of phosphine oxides, phosphine sulfides, and amine oxides; reducing agent for nitro groups and sulfur diimides.
synthetische
Hexachlorodisilane is prepared in the chlorination of silicides such as e.g. calcium silicide. Idealized syntheses are as follows: CaSi2 + 4 Cl2 → Si2Cl6 + CaCl2
Reaktionen
Hexachlorodisilane is a versatile chemical reagent that can be used in the following chemical reactions^[1-2]:
(1) When hexachlorodisilane is heated with a catalytic amount of triphenylphosphine or triphenylarsine, it decomposes according to the equation nSi2Cl6 = nSiCl4 + (SiCl2)n. It does not react with trifluoromethylphosphine. Hexabromodisilane is also decomposed by trimethylamine.
(2) Hexachlorodisilane reacts with hydrogen chloride in the presence of pyridine, and the reaction formula is:
Si2Cl6 + 2HCl = 2SiCl4 + H2.
(3) Excess hydrogen bromide and hexachlorodisilane produce a mixture of hydrogen chloride and hydrogen bromide.
(4) Hexachlorodisilane reacts with methyl chloride in the presence of triphenylphosphine to produce a mixture of methyltrichlorosilane and silicon tetrachloride. When hexachlorodisilane and methyl bromide are heated together in the presence of triphenylphosphine, a mixture of methyl chloride and bromine is produced.
(5) Hexachlorodisiloxane reacts with sulfur trioxide to produce silicon dioxide, sulfur dioxide and hexachlorodisiloxane.
Allgemeine Beschreibung
Hexachlorodisilane (HCDS) is a chlorosilane used as a precursor for producing disilanes. It is a dioxidizer that is used in the production of silicon films and silicon nitride based films.
Flammability and Explosibility
Non flammable
Filter für giftige stoffe
The ITSL for hexachlorodisilane has been changed from 0.04 μg/m3 to 0.1 μg/m3 based on annual averaging time.
Einzelnachweise
[1] H.J. EMELéUS; Muhammad T. Reaction of hexachlorodisilane with bases and alkyl halides[J]. Journal of Inorganic and Nuclear Chemistry, 1967. DOI:10.1016/0022-1902(67)80468-8.
[2] B. S. SURESH D. P. Preparation of Hexafluorodisilane and Reactions of Hexafluorodisilane and Hexachlorodisilane with Sulfur Trioxide[J]. ACS Applied Electronic Materials, 1985. DOI:10.1246/BCSJ.58.1867.

Hexachlorodisilane Upstream-Materialien And Downstream Produkte

Hexachlordisilan Anbieter Lieferant Produzent Hersteller Vertrieb Händler.

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