氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,

氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,,,结构式
氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,
  • CAS号:
  • 英文名:Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr)
  • 中文名:氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,
  • CBNumber:CB51569112
  • 分子式:HfO2
  • 分子量:210.4888
  • MOL File:Mol file
氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,上下游产品信息
上游原料
下游产品
氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,生产厂家
  • 公司名称:Alfa Aesar
  • 联系电话:--
  • 电子邮件:tech@alfa.com
  • 国家:美国
  • 产品数:6823
  • 优势度:81
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