氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,
英文名称:Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr)
CAS号:
分子式:HfO2
分子量:210.4888
EINECS号:
Mol文件:Mol File
