氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,
Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr) 基本信息更多
- 中文名称:氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,
- 中文同义词: 氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95 (METALS BASIS EXCLUDING ZR) 氧化铪(IV)溅射靶, 76.2MM (3.0IN) 直径 X 6.35MM (0.25IN) 厚, 99.95 (METALS BASIS 去除 ZR) 氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,
- 英文名称:Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr)
- 英文同义词: Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr) Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis
- CAS号:
- 分子式:HfO2
- 分子量:210.4888
- EINECS号:
- Mol文件:Mol File
-
