HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)

HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR),,结构式
HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
  • CAS号:
  • 英文名:HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
  • 中文名:
  • CBNumber:CB1661031
  • 分子式:HfO2
  • 分子量:210.4888
  • MOL File:Mol file
HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)上下游产品信息
上游原料
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HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)生产厂家
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