HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR) 基本信息更多
- 中文名称:HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
- 中文同义词:
- 英文名称:HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
- 英文同义词: HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
- CAS号:
- 分子式:HfO2
- 分子量:210.4888
- EINECS号:
- Mol文件:Mol File
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