HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
英文名称:HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
CAS号:
分子式:HfO2
分子量:210.4888
EINECS号:
Mol文件:Mol File