Uses
1H,1H,2H,2H-Perfluorooctyltrichlorosilane is used in the silanization of silicon wafer. Self assembled monolayers treated with this, acts as an anti adhesive layer and release of cured poly(dimethyl siloxanes). It is also used to fabricate chemical surface patterns of self assembled monolayers.
Synthesis
3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctene, starting materials, are charged under an N2 atmosphere to a three-necked glass flask, and CPC 072 (Pt(0)-divinyltetramethyidisiloxane in xylene) is added. Trichlorosilane is added dropwise at room temperature and with stirring over 85 minutes. The immediately ensuing reaction is exothermic, the temperature rising to 115° C. After the purification, 1H,1H,2H,2H-Perfluorooctyltrichlorosilane are obtained (yield: 99%).
