Гексаметилдисилоксан

Химические свойства

Hexamethyldisiloxane(HMDS) has a very low water solubility and is highly volatile. It is therefore difficult to perform biodegradability and toxicity tests. Experimental data on degradation in water are not available. Based on chemical structure, no aerobic biodegradation of HMDS in water is expected. The half-life of HMDS in marine water is thus expected to be more than 60 days and the persistence (P) criterion is fulfilled.

Физические свойства

Hexamethyldisiloxane is a colorless and transparent liquid. It is easily deliquescent, flammable, and has the risk of causing combustion when exposed to high heat, open flame, and strong oxidizing agents. Boiling point 99.5℃. Flash point -1.1℃. Relative density (d2525) 0.7606. refractive index 1.3750. insoluble in water, soluble in many organic solvents.

Использование

Hexamethyldisiloxane is used as a base fluid in a wide range of personal care products that require fast evaporation and high spreadability. When blended with Dimethicone fluids, It can adjust the residence time of the silicone on the skin. Unlike other volatile fluids, Hexamethyldisiloxane Fluid does not cool the skin as it evaporates. Hexamethyldisiloxane is used as a carrying agent and diluent in the following: skin cream lotions, bath oils, suntan lotions, nail polishes, antiperspirants, deodorants, hair sprays and other beauty and hair care products.
A silicon based compound that can be used to create potentially biocompatible materials.
Used as a monomer in the synthesis of long chain polysiloxane structures.
Used in the methylation of mercury(II) salts.

Определение

ChEBI: Hexamethyldisiloxane is an organosiloxane consisting of two trimethylsilyl groups covalently bound to a central oxygen.

Методы производства

Produced via acid hydrolysis of chlorotrimethylsilane and purification by distillation.

Общее описание

Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane in silicon integrated circuit technology. Its dissociative ionization by electron impact has been studied by Fourier transform mass spectrometry. Synthesis of plasma-polymerized HMDSO thin films by atmospheric pressure glow (APG) discharge has been reported. Crystals of HMDSO at 148K are monoclinic. Addition of HMDSO to P₄S₁₀, improves its efficiency as thionating agent.

Методы очистки

Fractionally distil through a column packed with glass helices with ca 15 theoretical 20 1.3777. plates. It is highly flammable and is an irritant. [Mills & McKenzie J Am Chem Soc 76 2672 1954, Csakvari et al. J Organometal Chem 107 287 1976, Beilstein 4 IV 4018.]