Iodotrimethylsilane: Applications as Reactive Ligand and its Preparation Method

Iodotrimethylsilane, also known as Trimethylsilyl iodide, is a chemical compound with the molecular formula C3H9ISi. It possesses a CAS number of 16029-98-4. It is a colorless to pale red flammable liquid with a boiling point of approximately 106°C and a density of 1.406 g/cm³. Its primary usage lies as a significant synthetic reagent and silylating agent, especially in the synthesis of cephalosporins such as ceftazidime.¹

Applications as Reactive Ligand

Resurfacing perovskite nanocrystals (NCs) with tight-binding and conductive ligands to resolve the dynamic ligands-surface interaction is the fundamental issue for their applications in perovskite light-emitting diodes (PeLEDs). Although various types of surface ligands have been proposed, these ligands either exhibit weak Lewis acid/base interactions or need high polar solvents for dissolution and passivation, resulting in a compromise in the efficiency and stability of PeLEDs. Herein, we report a chemically reactive agent (Iodotrimethylsilane, TMIS) to address the trade-off among conductivity, solubility and passivation using all-inorganic CsPbI3 NCs. The liquid TMIS ensures good solubility in non-polar solvents and reacts with oleate ligands and produces in situ HI for surface etching and passivation, enabling strong-binding ligands on the NCs surface. We report, as a result, red PeLEDs with an external quantum efficiency (EQE) of ≈23 %, which is 11.2-fold higher than the control, and is among the highest CsPbI3 PeLEDs. We further demonstrate the universality of this ligand strategy in the pure bromide system (CsPbBr3 ), and report EQE of ≈20 % at 640, 652, and 664 nm. This represents the first demonstration of a chemically reactive ligand strategy that applies to different systems and works effectively in red PeLEDs spanning emission from pure-red to deep-red.²

Preparation Method

A preparation method for Iodotrimethylsilane, is characterized in that, the method comprises the following steps:

Under shielding gas exists; aluminum trichloride (anhydrous), hexamethyldisiloxane are joined in reaction vessel; start stirring, be warming up to 40-50 DEG C, then add elemental iodine; elemental iodine has added rear bath temperature rise to 120-140 DEG C; reaction backflow 1-1.5 hour, device changes water distilling apparatus into, air distillation; collect 106-107 DEG C of cut, obtain Iodotrimethylsilane.

Reference

1. Iodotrimethylsilane. National Center for Biotechnology Information. 2024; PubChem Compound Summary for CID 85247.

2. Zhao F, Duan HW, Li SN, et al. Iodotrimethylsilane as a Reactive Ligand for Surface Etching and Passivation of Perovskite Nanocrystals toward Efficient Pure-red to Deep-red LEDs. Angew Chem Int Ed Engl. 2023; 62(46): e202311089.

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