四乙基硅烷

Mass

MS-IW-7605          
tetraethylsilane
C8H20Si             (Mass of molecular ion:    144)

   Source Temperature: 220 °C
   Sample Temperature: 150 °C
   Reservoir, 75 eV

      29.0       1.9
      31.0       4.7
      43.0       4.3
      44.0       1.1
      45.0       3.0
      55.0       2.2
      56.0       1.4
      57.0       5.8
      58.0       6.6
      59.0      37.9
      60.0       2.9
      61.0       1.2
      85.0       1.1
      86.0       1.9
      87.0     100.0
      88.0      10.6
      89.0       4.1
     115.0      84.3
     116.0      10.0
     117.0       3.3
     144.0       3.7

Assign. Shift(ppm) A 0.929 B 0.509

     Hz     ppm     Int.

    382.69   0.958    107
    379.64   0.950    644
    376.46   0.942    100
    374.63   0.938    178
    371.95   0.931   1000
    371.46   0.930    993
    368.77   0.923    138
    368.41   0.922    138
    366.82   0.918     96
    363.77   0.911    690
    360.60   0.903     95
    217.29   0.544     40
    214.48   0.537    307
    213.99   0.536    295
    209.84   0.526     82
    206.54   0.517    723
    203.13   0.509     79
    201.90   0.506     75
    198.61   0.497    653
    195.07   0.489     72
    190.67   0.478    223
    190.19   0.476    220