甲基三乙氧基硅烷

Mass

MS-NW-5022          
triethoxy(methyl)silane
C7H18O3Si           (Mass of molecular ion:    178)

   Source Temperature: 250 °C
   Sample Temperature: 190 °C
   Reservoir, 75 eV

      15.0       1.8
      26.0       2.0
      27.0       3.8
      28.0       2.4
      29.0       3.3
      31.0       2.0
      43.0       2.5
      45.0      13.5
      59.0       2.5
      60.0       1.9
      61.0      10.2
      62.0       2.4
      63.0       4.3
      73.0       5.0
      74.0       2.8
      75.0       1.6
      76.0       1.6
      77.0      30.0
      78.0       2.0
      79.0      10.5
      81.0       1.8
      88.0       1.9
      89.0      16.5
      90.0       1.9
      91.0       7.0
     103.0       2.7
     105.0      15.7
     106.0       1.5
     107.0       8.8
     117.0       2.3
     119.0      53.1
     120.0       5.3
     121.0       2.7
     133.0      66.1
     134.0       7.4
     135.0      10.7
     136.0       1.0
     147.0       1.0
     149.0       4.7
     163.0     100.0
     164.0      12.1
     165.0       4.8
     177.0       2.2
     178.0       2.8

Assign. Shift(ppm) A 0.129 B 1.233 C 3.809

     Hz     ppm     Int.

    352.19   3.933    118
    345.00   3.853    440
    343.63   3.837     34
    338.00   3.775    464
    336.56   3.758     38
    331.19   3.698    143
    117.06   1.308    477
    110.19   1.231   1000
    103.13   1.152    411
     11.56   0.130    755