甲基二乙氧基硅烷

Mass

MS-IW-8100          
diethoxymethylsilane
C5H14O2Si           (Mass of molecular ion:    134)

   Source Temperature: 210 °C
   Sample Temperature: 150 °C
   Reservoir, 75 eV

      27.0       2.3
      28.0       1.2
      29.0       1.9
      31.0       1.7
      43.0       5.8
      44.0       1.2
      45.0      13.0
      46.0       1.0
      47.0       1.8
      52.0       3.8
      59.0       7.0
      60.0       1.1
      61.0      30.1
      62.0       3.0
      63.0      30.1
      64.0       1.6
      65.0       1.1
      73.0       4.4
      75.0      15.4
      76.0       1.5
      77.0      21.7
      78.0       1.3
      79.0       1.0
      89.0      47.0
      90.0       4.4
      91.0      39.2
      92.0       3.0
      93.0       1.6
     103.0       2.1
     105.0      12.6
     106.0       1.1
     117.0       1.3
     119.0      70.3
     120.0       6.8
     121.0       3.7
     123.0       1.1
     133.0     100.0
     134.0      11.3
     135.0       4.9
     149.0       1.1
     163.0       1.0
     179.0       1.7
     193.0       1.5

Assign. Shift(ppm) A 4.583 B 3.814 C 1.240 D 0.201

     Hz     ppm     Int.

   1834.47   4.591     53
   1832.76   4.586    136
   1831.05   4.582    140
   1829.35   4.578     54
   1535.52   3.843    140
   1531.98   3.834     25
   1528.32   3.825    403
   1524.90   3.816     29
   1521.36   3.807    439
   1517.94   3.799     29
   1514.53   3.790    179
    503.05   1.259    563
    495.97   1.242   1000
    489.01   1.224    630
     84.59   0.212     65
     82.89   0.208     99
     81.30   0.204    593
     79.47   0.199    645
     75.81   0.190     31