| 英文名称 |
中文名称 |
CAS |
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Optical coating
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进口光学镀膜机 |
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NIE-3500(A) fully automatic ion beam cleaning system
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NIE-3500（A）全自动离子束清洗系统 |
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LSC-5000 Fully Automatic Megasound Large Substrate Wet Stripping System
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LSC-5000全自动兆声大基片湿法去胶系统 |
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Ion Beam Etcher NIE-4000(A) Fully Automatic IBE Ion Beam Etcher Nano-Master
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离子束刻蚀机 NIE-4000（A）全自动IBE离子束刻蚀 那诺-马斯特 |
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SWC-5000 Fully Automatic Megasonic Wafer Cleaning Machine
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SWC-5000全自动兆声晶圆清洗机 |
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NPD-4000(A) fully automatic PLD pulse laser deposition system
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NPD-4000（A）全自动PLD脉冲激光沉积系统 |
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NIM-4000(A) fully automatic ion milling and etching
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NIM-4000（A）全自动离子铣刻蚀 |
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NRE-3500(M) Reactive Ion Etcher
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NRE-3500（M）反应离子刻蚀机 |
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NRE-4000(A) fully automatic reactive ion etching
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NRE-4000（A）全自动反应离子刻蚀 |
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NEE-4000(A) Fully Automatic Electron Beam Evaporation System
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NEE-4000（A）全自动电子束蒸发系统 |
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NTE-3500(A) Fully automatic thermal evaporation system
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NTE-3500（A）全自动热蒸发系统 |
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NSC-3500(A) fully automatic magnetron sputtering system
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NSC-3500（A）全自动磁控溅射系统 |
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NSC-4000(A) fully automatic magnetron sputtering system
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NSC-4000（A）全自动磁控溅射系统 |
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NPE-4000(A) fully automatic PECVD plasma chemical vapor deposition system
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NPE-4000（A）全自动PECVD等离子体化学气相沉积系统 |
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Magnetron Sputtering Machine NSC-4000SPUTTER Magnetron Sputtering Coating Machine Nano-Master
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磁控溅射仪 NSC-4000Sputter磁控溅射镀膜机 那诺-马斯特 |
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Etching equipment NRE-3500(A) fully automatic reactive ion etcher Nano-Master
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刻蚀设备 NRE-3500（A）全自动反应离子刻蚀机 那诺-马斯特 |
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Magnetron sputtering coating machine NSC-3500(M)Magnetron sputtering system for laboratory research and development
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磁控溅射镀膜机 NSC-3500（M）实验室研发用磁控溅射系统 |
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NPC-4000(A) fully automatic plasma stripping machine (etching machine)
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NPC-4000（A）全自动等离子去胶机（刻蚀机） |
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LSC-4000 Megasonic Substrate Wet Degumming and Cleaning System
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LSC-4000兆声大基片湿法去胶清洗系统 |
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SWC-3000 Megasonic Assisted Photoresist Stripping System
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SWC-3000兆声辅助光刻胶剥离系统 |
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SWC-4000 Megasonic Wafer (Mask) Cleaning Machine
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SWC-4000兆声晶圆（掩模版）清洗机 |
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Metal Organic Chemical Vapor Deposition System MOVPE Equipment
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金属有机化学气相沉积系统MOVPE设备 |
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NIE-4000(M)IBE Ion Beam Etching
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NIE-4000（M）IBE离子束刻蚀 |
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NLD-4000(A) fully automatic atomic layer deposition system
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NLD-4000（A）全自动原子层沉积系统 |
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NRE-4000 RIE-PE Etching Machine
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NRE-4000型RIE-PE刻蚀机 |
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NMC-4000(A) fully automatic PAMOCVD system
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NMC-4000（A）全自动PAMOCVD系统 |
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NDR-4000(A) Fully Automatic DRIE Deep Reactive Ion Etching
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NDR-4000（A）全自动DRIE深反应离子刻蚀 |
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ALD atomic layer deposition NLD-3000 atomic layer deposition system
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ald原子层沉积 NLD-3000原子层沉积系统 |
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PECVD equipment microwave plasma chemical vapor deposition system
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PECVD设备 微波等离子化学气相沉积系统 |
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Wafer cleaning equipment SWC-4000 Megasonic wafer (mask) cleaning machine
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晶圆清洗设备 SWC-4000兆声晶圆（掩模版）清洗机 |
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NA
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台阶仪 KLA 探针式表面轮廓仪 P-7（台阶仪） |
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NA
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Alpha-Step D-500 探针式轮廓仪/台阶仪 |
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NA
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KLA-D600 高精度探针式轮廓仪/台阶仪 Alpha-Step D-600 |
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NA
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KLA光学轮廓仪 Profilm 3D 白光干涉仪 |
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Optical Profiler
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美国 光学轮廓仪 Zeta-300 多模式三维光学轮廓仪 |
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Spin Coater
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匀胶机/旋涂仪 |
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