- INDIUM(III) NITRATE PENTAHYDRATE 99.99%
- 27765-48-6 氟硼酸铟
- 72451-33-3 5,10,15,20-四苯基-21H,23H-卟啉铟(1+)
- 氯化铟[113MIN]
- 111-indium-ethylenediaminetetracetic acid-biotin
- INDIUM ETHYLHEXANO-MONOISOPROPOXIDE
- INDIUM TRIFLUORIDE, ANHYDROUS 99.
- INDIUM SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.999% (METALS BASIS)
- INDIUM WIRE, 0.25MM (0.01IN) DIA, PURATRONIC®, 99.998+% (METALS BASIS)
- 14191-71-0 Indium115
- 14885-78-0 Indium113
- indium In 113m sulfur colloid
- INDIUM DIMETHYLAMIDE
- INDIUM DIETHYLAMIDE
- 20661-21-6 氢氧化铟
- 13465-09-3 溴化铟(III)
- 68310-35-0 indium(3+) neodecanoate
- 158346-28-2 INDIUM MAGNESIUM OXIDE
- 38218-24-5 异丙醇铟
- 铟原子标样
- 15750-15-9 Indium111
- 1303-11-3 砷化铟
- INDIUM SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 99.999% (METALS BASIS)
- INDIUM(III)-BROMID
- 铟溅射靶材, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 9
- 13465-14-0 硝酸铟
- 12030-14-7 4N硫化铟
- INDIUM WIRE, 0.5MM (0.02IN) DIA, PURATRONIC®, 99.998+% (METALS BASIS)
- INDIUM WIRE, 0.5MM (0.02IN) DIA, PURATRONIC®, 99.999% (METALS BASIS)
- 22519-64-8 氯化铟(Ⅲ)四水合物
- INDIUM INGOT, 99.999% (METALS BASIS)
- 鎵銦合金
- Indium antimony
- 10025-82-8 Indium chloride
- Indium ion(+3)
- 硫酸铟水合物, PURATRONIC|R, 99.999 (METALS BASIS)
- IndiumIngots(99.99%)
- Indium bromide
- 10025-82-8 氯化铟
- INDIUM ICP/DCP STANDARD SOLUTION (HNO3)
- INDIUM WIRE, 1.0MM (0.04IN) DIA, PURATRONIC®, 99.999% (METALS BASIS)
- INDIUM(III)SULPHATE,HYDRATE
- INDIUMDIETHYLENETRIAMINEPENTAACETICACID
- INDIUM WIRE, 1.0MM (0.04IN) DIA, PURATRONIC®, 99.998+% (METALS BASIS)
- INDIUM POWDER, -325 MESH, PURATRONIC®, 99.999% (METALS BASIS)
- INDIUM - 4% HNO3 500ML
- 13465-11-7 氯化铟(II)
- INDIUM SULFAMATE SOLUTION,10% IN
- INDIUM CARBONATE
- INDIUM TIN ALKOXIDE
- INDIUM FLUORIDE, HYDROUS
- 304671-64-5 乙酸铟水合物
- 50800-85-6 Indium trichloride-In111
- INDIUM(III)SULPHATE,ANHYDROUS
- INDIUM - 10% HCL 500ML
- 12125-53-0 indium hydroxide oxide
- 12030-24-9 硫化铟
- indium DTPA-albumin
- indium-pentetreotide
- Indium 111In-satumomab pendetide
- indium-ethylenedicysteine
- INDIUM - 4% HNO3 250ML
- INDIUM SHOT, 1MM (0.04IN), PURATRONIC®, 99.999% (METALS BASIS)
- INDIUM FOIL, 2.0MM (0.08IN) THICK, PURATRONIC®, 99.998% (METALS BASIS)
- INDIUM FOIL, 0.25MM (0.01IN) THICK, 99.99% (METALS BASIS)
- INDIUM, PLASMA STANDARD SOLUTION, SPECPURE®, IN 10,000µG/ML
- INDIUM SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.99% (METALS BASIS)
- 17069-79-3 INDIUM(III) SULFATE PENTAHYDRATE
- 7783-52-0 氟化铟
- indium aggregated albumin
- 用于 AAS 的铟标准品
- 314041-16-2 高氯酸铟
- 锡酸铟 溅射靶材
- 铟 等离子标准溶液
- 13464-82-9 硫酸铟
- INDIUM FLUOBORATE
- INDIUM N-PROPOXIDE
- 14166-78-0 氟化铟(III)三水
- 1312-43-2 氧化铟
- INDIUM ICP STANDARD SOLUTION FLUKA FOR
- 14405-45-9 2,4-戊二酸铟
- Indium: 7N+purity ingot, shapes and shot
- Indium: MBE grade 7N+ purity shaped ingot and shot
- Indium(II)dihydoxide
- Indium(II) tetrafluoroborate
- Indium(I) fluoride
- Indium triperchlorate octahydrate
- Indium(I) tetrafluoroborate
- 12672-70-7 三氯化铟
- INDIUM DICHLORIDE
- 异辛酸铟
- 158346-34-0 INDIUM-IRON OXIDE
- 13465-15-1 八水高氯酸铟
- INDIUM SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.999% (METALS BASIS)
- INDIUMPLASMAEMISSIONSTANDARD,1ML=10MGIN
- indium DTPA-adriamycin
- indium 1-(4-isothiocyanatobenzyl)diethylenetriaminepentaacetic acid
- 14693-82-4 磷酸铟
- INDIUM (II) SELENIDE
- 13770-61-1 硝酸铟
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