Fluorine nitrogen is the most common fluorine-containing mixed gas, usually packaged in steel cylinders, with a concentration range of 5 to 20%. In the domestic and international markets, fluorine nitrogen is used more and more widely, mainly in the following fields:
(1) Surface treatment of polymer materials: The modified materials have the characteristics of high temperature resistance, oil resistance, high vacuum resistance, acid and alkali resistance, and resistance to various chemicals. They have been used in industries such as automobiles, medicine, high-energy materials, and gasoline tools. field;
(2) Fluorination synthesis of fine chemicals. Since fluorine has the smallest radius and large electronegativity, the C-F bond energy it forms is much greater than the C-H bond energy, which significantly increases the stability and physiological activity of organic fluorine compounds. In addition, it contains Fluorine organic compounds also have high fat solubility and hydrophobicity, which promotes their absorption and transmission speed in the organism and changes physiological effects. Therefore, many fluorine-containing medicines and pesticides have relatively low dosage, low toxicity, high efficacy, and strong metabolism in terms of performance, making them account for an increasing proportion of new medicines and pesticides. In addition, fluorine-containing dyes, fluorine-containing surfactants, fluorine-containing clothing finishing agents, and fluorine-containing fluorocarbon coatings also use fluorine gas as raw materials in large quantities.
(3) Etching gas in the electronics industry. Etching is an important link in the electronics industry and directly determines important properties such as the capacity of electronic products. The electronics industry uses fluorine-containing gases such as nitrogen trifluoride and carbon tetrafluoride as etching gases, and the principle is to utilize the fluorine element in these fluorine-containing gases. As the chip capacity of the electronics industry increases day by day, the original macromolecule gases are gradually unable to adapt to the increasingly narrow etching tracks, becoming a bottleneck restricting the development of the electronics industry. The fundamental way to solve this problem is to use only fluorine as an etchant and abandon the original large-diameter element compounds. Now, high-purity fluorine-nitrogen gas is already used as etching gas abroad, and this technology has also been introduced in China.
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