碳化钽溅射靶
Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis) 基本信息更多
- 中文名称:碳化钽溅射靶
- 中文同义词: 碳化钽溅射靶, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 碳化钽溅射靶 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 碳化钽溅射靶 碳化钽溅射靶, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 碳化钽溅射靶, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 碳化钽溅射靶, 50.8MM (2.0IN) 直径 X 3.18MM (0.125IN) 厚, 99.5% (METALS BASIS) 碳化钽溅射靶 76.2MM (3.0IN) 直径 X 6.35MM (0.250IN) 厚, 99.95% (METALS BASIS)
- 英文名称:Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
- 英文同义词: Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis) Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis) Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis) Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
- CAS号:
- 分子式:
- 分子量:0
- EINECS号:235-118-3
- Mol文件:Mol File