碳化硅溅射靶
SILICON CARBIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.5% (METALS BASIS) 基本信息更多
- 中文名称:碳化硅溅射靶
- 中文同义词: 碳化硅溅射靶
- 英文名称:SILICON CARBIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.5% (METALS BASIS)
- 英文同义词: SILICON CARBIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.5% (METALS BASIS)
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- Mol文件:Mol File