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TETRAKIS(DIETHYLAMINO)ZIRCONIUM
TETRAKIS(DIETHYLAMINO)ZIRCONIUM
- CAS No.13801-49-5
- Chemical Name:TETRAKIS(DIETHYLAMINO)ZIRCONIUM
- CBNumber:CB5264241
- Molecular Formula:C4H11NZr
- Formula Weight:164.36
- MOL File:13801-49-5.mol
TETRAKIS(DIETHYLAMINO)ZIRCONIUM Property
- Boiling point 128 °C/0.05 mmHg (lit.)
- Density 1.026 g/mL at 25 °C (lit.)
- refractive index n
20/D 1.51(lit.) - Flash point 54 °F
- storage temp. 2-8°C
- form liquid
- color yellow
- Sensitive Moisture Sensitive
- UNSPSC Code 12352300
- NACRES NA.23
Safety
- Hazard Codes :F,Xi
- Risk Statements :11-14-36/37/38
- Safety Statements :16-26-36
- RIDADR :UN 3398 4.3/PG 2
- WGK Germany :3
- HazardClass :4.3
- PackingGroup :II
-
Symbol(GHS)
- Signal wordDanger
- Hazard statements H225-H261-H315-H319-H335
- Precautionary statements P210-P231+P232-P261-P305+P351+P338-P422
TETRAKIS(DIETHYLAMINO)ZIRCONIUM Chemical Properties,Usage,Production
- Description Tetrakis (diethylamino) zirconium is a useful precusor compound in the deposition of thin film ferroelectric materials by CVD. It is also useful in the production of olefin polymers1,2. As a precusor, it is also useful in the deposition of ZrN films using remote plasma-enhanced atomic layer deposition method3.
-
Reference
- Greenwald, Anton C. "CVD thin film compounds." US, US5104690. 1992.
- Murray, Rex Eugene. "Catalyst for the production of olefin polymers." US, US 6320005 B1. 2001.
- Cho, Seungchan, et al. "Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis (diethylamino) zirconium Precursor." Japanese Journal of Applied Physics 46. 7A (2007):4085-4088.
- Uses Tetrakis(diethylamino)zirconium is used in the preparation of ZrN and ZrO2 films as well as zirconium complexes to act as catalytic precursors for organic chemical reactions.
- General Description Atomic number of base material: 40 Zirconium
- reaction suitability core: zirconium
TETRAKIS(DIETHYLAMINO)ZIRCONIUM Preparation Products And Raw materials
Raw materials
Preparation Products
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13801-49-5, TETRAKIS(DIETHYLAMINO)ZIRCONIUMRelated Search:
- TETRAKIS(ACETONITRILE)SILVER(I) TETRAFLUOROBORATE Trityl tetrakis(pentafluorophenyl)borate TETRAKIS(DIMETHYLAMINO)TIN TETRAKIS(DIMETHYLAMINO)ZIRCONIUM Vanadium tetrakis(dimethylamide) TETRAKIS(DIMETHYLAMINO)TITANIUM Tetrakis(triphenylphosphine)nickel TETRAKIS(ETHYLMETHYLAMINO)HAFNIUM TETRAKIS(DIETHYLAMINO)TITANIUM Tetrakis(ethylmethylamino)vanadium(IV) TETRAKIS(DIETHYLAMINO)HAFNIUM Tetrakis(triphenylphosphine)palladium TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV) TETRAKIS(ETHYLMETHYLAMINO)ZIRCONIUM TETRAKIS(DIETHYLAMINO)ZIRCONIUM Zirconium ZIRCONIUM HYDRIDE TETRAKIS(DIMETHYLAMINO)ZIRCONIUM
- Zirconium
- Vapor Deposition Precursors
- metal amide complex
- Precursors by Metal
- 医用原料
- 金属催化剂
- 化工原料
- C16H40N4Zr
- C4H11N14Zr
- ZrNCH2CH324
- C2H52N4Zr
- 四(二乙基氨基)锆(IV)
- 四(二乙氨基)锆
- 四(乙氨基)锆
- 四(乙氨基)锆(IV)
- 四(二乙氨基)锆(IV)
- 13801-49-5
- TETRAKIS(DIETHYLAMINO)ZIRCONIUM ISO 9001:2015 REACH
- amido)zirconium(IV)
- ZIRCONIUM DIETHYLAMIDE
- TETRAKIS(DIETHYLAMINO)ZIRCONIUM
- tetrakis(diethylamido)zirconium(iv)
- Tetrakis(diethylamino)zirconium,99%
- Tetrakis(diethylamino)zirkonium
- TETRAKIS(DIETHYLAMIDO)ZIRCONIUM(IV), ELECTRONIC GRADE, 99.99+%
- Zirconium, tetrakis(diethylamino)-
- Tetrakis(diethylaMino)zirconiuM(IV), 99%