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• Description

  Silicon Iodide is the iodide of silicon. It is a precursor to silicon amide. It is also applied in the manufacture and etching of silicon in microelectronics. Selective area regrowth of silicon-doped GaAs has been successfully achieved by chemical beam epitaxy (CBE) on dry etched trench structures. Silicon tetraiodide is useful for the above process in abrupt to manipulate metal-semiconductor field effect transistor (MESFET) and heterostructure field effect transistor (HFET). Silicon iodide can also be reduced as the source to form pure silicon and hydrogen iodide. ;

• Reference

  1. Izumi, Shigekazu, et al. Journal of Crystal Growth 175.175(1997): 404-410.
  2. http://jes.ecsdl.org/content/104/11/663.short
  3. https://en.wikipedia.org/wiki/Silicon_tetraiodide
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