- TANSHINONE IIA SILATE
- 丹参酮IIB
- Tantalum standard solution,for AAS,1 mg/ml Tain 5% HF
- Tantalum(V) Chloride, Resublimed 99.999%
- Tantalum Isopropoxide 99.9%
- Tantalum (Ta) Standard Solution
- Tantalum (Ta) in water with trace HF, 10 000 μg/mL
- 钽,等离子标准溶液, SPECPURE, TA 10,000ΜG/ML
- 13569-67-0 tantalum trichloride
- 13569-72-7 tantalum tetrachloride
- 37349-51-2 氢氧化钽
- TANTALUM 10,000 PPM ICP STANDARD SOLUTION
- TANTALUM WIRE, 0.127MM (0.005IN) DIA, 99.9% (METALS BASIS)
- TANTALUM POWDER, -100 MESH, PURATRONIC®, 99.98% (METALS BASIS), NB 50PPM
- TANTALUM INGOT
- TANTALUM OXALATE
- TANTALUM SLUG, 3.175MM (0.125IN) DIA X 6.35MM (0.25IN) LENGTH, 99.95% (METALS BASIS)
- 12039-55-3 硒化钽
- TANTALUM FOIL, 1.5MM (0.06IN) THICK, 99.95% (METALS BASIS)
- 五(二乙氨基)钽
- TANTALUM STANDARD SOLUTION, 1 MG/ML TA IN 5% HF, FOR AAS
- TANTALUM STANDARD SOLUTION
- TANTALUM POWDER, -22 MESH, PURATRONIC®, 99.98% (METALS BASIS), NB 50PPM
- TANTALUM FOIL, 0.25MM (0.01IN) THICK, ANNEALED, 99.95% (METALS BASIS)
- TANTALUM FOIL, 0.7MM (0.03IN) THICK, 99.9% (METALS BASIS)
- TANTALUM(V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS)
- 钽舟
- TANTALUM PENTA-N-PROPOXIDE
- TantalumPentoxid
- 744-25-7 TantalumRods,99.9%
- TantalumTarget
- 7783-71-3 五氟化钽
- TANTALUM - 5% HNO3 + 2% HF 500ML
- TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS)
- TANTALUM, PLASMA STANDARD SOLUTION, SPECPURE®, TA 10,000µG/ML
- TANTALUM POWDER, APS <2 MICRON, 99.9% (METALS BASIS)
- TANTALUM GAUZE, 30 MESH WOVEN FROM 0.076MM (0.003IN) DIA WIRE
- 12033-62-4 氮化钽
- TANTALUM WIRE, 1.0MM (0.04IN) DIA, ANNEALED, 99.95% (METALS BASIS)
- 12007-35-1 二硼化钽
- 1314-61-0 氧化钽
- TantalumAndTitaniumRod,Sheet,Plate
- TANTALUM PELLET, 1MM (0.04IN) DIA X 2MM (0.08IN), 99.9% (METALS BASIS)
- TANTALUM (V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3
- Tantalum ICP-MS Standard
- 12033-94-2 Tantal(V)nitrid
- 16761-83-4 五异丙氧基钽
- TANTALUM TUBING 10MM O.D. X 0.5MM WALL
- TANTALUM SLUG, 3.175MM (0.125IN) DIA X 3.175MM (0.125IN) LENGTH, 99.95% (METALS BASIS)
- 碳化钽溅射靶
- 氧化钽溅射靶
- tantalus protein
- 59763-75-6 氧化钽
- TANTALUMPLASMAEMISSIONSTANDARD,1ML=10MGTA
- 12070-06-3 碳化钽
- 12143-72-5 二硫化钽
- Tantalum(V) bromide
- tantalite
- 14693-81-3 碘化钽
- TANTALUM NITRATE
- TANTALUM PENTA-I-BUTOXIDE
- 20219-33-4 四乙醇乙酰丙酮钽
- TANTALUM ALUMINUM-I-PROPOXIDE
- TANTALUM(V) TETRAETHOXYDIMETHYLAMIDOETHOXIDE/ 99.99%
- Tantalum(v)chlorideanhydrous(99.9%-ta)
- TANTALUM GAUZE, 50 MESH WOVEN FROM 0.076MM (0.003IN) DIA WIRE
- TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS)
- TANTALUM - 5% HNO3 + 2% HF 250ML
- 31791-37-4 tantalum(5+) oxalate
- TANTALUM FOIL, 1.0MM (0.04IN) THICK, 99.95% (METALS BASIS)
- TANTALUM SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.95% (METALS BASIS EXCLUDING NB)
- TANTALUM (V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6
- TANTALUM 1,000 PPM ICP STANDARD SOLUTION
- TANTALUM WIRE, 0.5MM (0.02IN) DIA, ANNEALED, 99.95% (METALS BASIS)
- 12653-85-9 Tantalum boride
- TANTALUM (V) ISOPROPOXIDE, 10% W/V IN ISOPROPANOL/HEXANE, 99
- 鉭標準液
- TANTALUMPLASMAEMISSIONSTANDARD,1ML=1MGTA
- TANTALUM (V) (TETRAETHOXY)[BREW]
- TANTALUM PENTA-T-BUTOXIDE
- TANTALUM WIRE, 0.25MM (0.01IN) DIA, ANNEALED, 99.9+% (METALS BASIS)
- Tantalum(V) Chloride, Resublimed
- 13053-54-8 三氟乙醇钽
- 12007-07-7 硼化钽
- 865-35-0 甲醇钽
- TANTALUM PENTA PHENOXIDE
- TANTALUM PENTA-SEC-BUTOXIDE
- 12004-76-1 铝化钽
- TANTALUM CARBIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.1
- TANTALUM(V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS)
- 1314-61-0 Tantalum(V) oxide
- TANTALUM (V) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6
- TANTALUM (V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3
- 13451-11-1 五溴化钽
- 13981-95-8 氢化钽
- Tantalate ion(-1)
- Tantalum nitride
- 7783-71-3 Tantalum(V) fluoride
- TANTALUM ROD, 2.8MM (0.11IN) DIA, 99.95% (METALS BASIS)
- Tantalum(V)chlorideresublimed(99.-ta)spectro
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