Ethyl 3-ethoxypropionate Basic information
| Product Name: |
Ethyl 3-ethoxypropionate |
| Synonyms: |
Ethyl 3-Ethoxy-2-Tert-Butylpropionate;Ethyl 3-Ethoxypropionate, Stabilized with BHT;Ethoxypropionic Acid Ethyl Es;Ethyl 3-ethoxypropiote;3-ETHOXYPROPIONIC ACID ETHYL ESTER;ETHYL 3-ETHOXYPROPANOATE;ETHYL 3-ETHOXYPROPIONATE;3-ethoxy-propanoicacidethylester |
| CAS: |
763-69-9 |
| MF: |
C7H14O3 |
| MW: |
146.18 |
| EINECS: |
212-112-9 |
| Product Categories: |
Solvent Packaging Options;Solvents;ACS and Reagent Grade Solvents;Amber Glass Bottles;Carbon Steel Flex-Spout Cans;For API's Production;ReagentPlus;ReagentPlus Solvent Grade Products;Semi-Bulk Solvents;Solvent Bottles;Solvent by Application |
| Mol File: |
763-69-9.mol |
 |
| |
| Ethyl 3-ethoxypropionate Chemical Properties |
Diethylene glycol monoethyl ether acetate(DCAC)&Ethyl 3-ethoxypropionate(EEP)
|
Item
|
Diethylene glycol monoethyl ether acetate (DCAC)
|
Ethyl 3-ethoxypropionate(EEP)
|
|
CAS
|
112-15-2
|
763-69-9
|
|
Molecular formula
|
CH3COOCH2CH2OCH2CH2OC2H5
|
C2H5OCH2CH2COOC2H5
|
|
Appearance
|
Colorless and clear liquid
|
Colorless and clear liquid
|
|
Purity %(GC)≥
|
99.0
|
99.5
|
|
Distillation range(℃/760mmHg)
|
213.0-223.0
|
165-172
|
|
Moisture(KF) %≤
|
0.05
|
0.05
|
|
Alcohol content%≤
|
/
|
0．1
|
|
Acidity (as HAC) %≤
|
0.03
|
/
|
|
Specific gravity (d420)
|
1.010±0.005
|
0.951±0.005
|
|
Color(Pt-Co)≤
|
10
|
10
|
|
Package and transportation
|
200KGS/Drum Common chemical
|
200KGS/Drum Common chemical
|
Application:
DCAC, a kind of environment-friendly and low-volatile solvent with excellent performance, is widely applied in electronic industry as cleaning agent, high resistance solvent, diluting agent of optical resist, optical resist remover, stripping agent, detergent for IC, photo resist-removing buffer solution, solution resin, etc.
EEP has strong solubility both for polar and non-polar substance with low volatility, low odor, low surface tension and high electrical resistance. It can be used in high resistance solvent, diluting agent of optical resist, optical resist remover, stripping agent, detergent for IC, photo resist-removing buffer solution, corrosive processing and other chemicals requiring special specification.
Chemwill Asia co.,Ltd is one of the leading manufacturer in CHINA.
Our main production base is located in Xuzhou industry park. We produce a wide range of organics including Active pharmaceutical ingredients(APIs), Veterinary, Indole derivatives, Aromatics, Fluorine, Boronic acids, organocatalysts, chiral building blocks, heterocyclic compounds. We are certified both to the ISO 9001 and ISO 14001 Standards, have a safety management system in place.
Our R&D team masters core technology for process-design of target building block as well as Tailor-made fine chemicals. Our manufactory specialised in extreme temperature conditions (-100ºC to +300ºC), hydrogenations reaction under high pressure, suzuki coupling reaction, photochemical reaction, Mitsunobu reactions, enantioselective reactions and asymmetric synthesis.
Think Chemistry,Think CHemWill
Factory Plant Address:
High-Tech Industrial park,Chemical Economical Development Zone,Xuzhou, Jiangsu-Province, P.R.China
Shanghai office: (Export Department)
Address: 16FL., INDUSTRY & COMMERCIAL BUILDING, NO.45 YAN’AN ROAD(E), 200002, SHANGHAI, CHINA
---any inquiries will be replied within 12 hours.
---golden manufactory under iso/gmp with large stock.
---dedication to quality,we have strict quality control system.
---oem/odm available.
---sample is available for your evaluation & formulation development.
Website: http://www.chemwill.com
PLS contact
Ms Ella Lee - Deputy Sales Manager
Phone: +86 -21-51086038
Email: chemwill_asia@126.com
chemwill@hotmail.com
China
