SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)
- Product NameSILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)
- CAS
- MFO2Si
- MW60.0843
- EINECS
- MOL FileMol File