Bis(1,4-Di-T-Butyl-1,3-Diazabutadienyl)Cobalt(Ii) Co(Dad)2, Min. 98% (99.999%-Co) Puratrem can be used in these fields:
Used for the vapor deposition (ALD and CVD) of cobalt-containing films.
The atomic layer deposition of cobalt metal films is described using bis(1,4-di-tert-butyl-1,3-diazabutadienyl) cobalt(II) and formic acid as precursors.
