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CHROMIUM(III) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.8% (METALS BASIS)

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CHROMIUM(III) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.8% (METALS BASIS)

中文名称:CHROMIUM(III) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.8% (METALS BASIS)
英文名称:CHROMIUM(III) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.8% (METALS BASIS)
CAS号:
分子式:Cr2O3
分子量:151.9904
EINECS号:
Mol文件:Mol File
CHROMIUM(III) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.8% (METALS BASIS) 结构式
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