Nitromethane dispersions can be used to cast thin films on glass, ITO, silicon wafers and many polymeric substrates. Compatibility of the polymeric substrate with nitromethane should be tested in each case. Coat the substrate with a "pool" of the nitromethane dispersion. Thin transparent films are typically spun at 1000 RPM or higher speeds, but more conducting films can be obtained at lower speeds. A single layer spun at 1000 RPM is typically 75 nm thick.
