SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.
SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)| 基本信息更多
- 中文名称:
- 中文同义词:
- 英文名称:SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)
- 英文同义词: SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)
- CAS号:
- 分子式:O2Si
- 分子量:60.0843
- EINECS号:
- Mol文件:Mol File