HAFNIUM OXIDE|氧化铪 溅射靶材
HAFNIUM OXIDE|氧化铪 溅射靶材 基本信息更多
- 中文名称:氧化铪 溅射靶材
- 中文同义词: 氧化铪 溅射靶材 氧化铪溅射靶材, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THIC 氧化铪溅射靶材, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR) 氧化铪(IV)溅射靶, 101.4MM (4.0IN) 直径 X 6.35MM (0.25IN) 厚, 99.95% (METALS BASIS 去除 ZR)
- 英文名称:HAFNIUM OXIDE
- 英文同义词: HAFNIUM(+4)OXIDE HAFNIUM(IV) OXIDE Hafnium(IV) oxide sputtering target, 101.4mm (4.0in) dia x 6.35mm (0.25in) thick, 99.95% (metals basis excluding Zr) Hafnium (IV) oxide sputtering target, 101.4mm (4.0 in.) dia. x 6.35mm (0.25 in.) thick
- CAS号:71243-80-6
- 分子式:HfO2
- 分子量:210.49
- EINECS号:235-013-2
- Mol文件:71243-80-6.mol
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