(SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 99.995% (METALS BASIS))
Basic informationMore
- Product Name:SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 99.995% (METALS BASIS)
- Synonyms: SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 99.995% (METALS BASIS)
- CAS:
- MF:O2Si
- MW:60.0843
- EINECS:
- Mol File:Mol File
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