ACGIH: STEL 1000 ppm OSHA: TWA 1000 ppm(1900 mg/m3) NIOSH: IDLH 3300 ppm; TWA 1000 ppm(1900 mg/m3)
Description
Lithium tantalum ethoxide is a precursor is used to deposit ultra thin films of Tantalum oxide and other tantalum containing films by atomic layer deposition and chemical vapor deposition methods.
