Cyclohexyl methyl methylphosphonate

그림문자(GHS)

• 그림문자(GHS)

  

• 유해·위험 문구

  H315：피부에 자극을 일으킴

  H319：눈에 심한 자극을 일으킴

  H335：호흡 자극성을 일으킬 수 있음

• 예방조치문구

  P261：분진·흄·가스·미스트·증기·...·스프레이의 흡입을 피하시오.

  P304+P340：흡입하면 신선한 공기가 있는 곳으로 옮기고 호흡하기 쉬운 자세로 안정을 취하시오.

  P305+P351+P338：눈에 묻으면 몇 분간 물로 조심해서 씻으시오. 가능하면 콘택트렌즈를 제거하시오. 계속 씻으시오.

  P405：밀봉하여 저장하시오.

Cyclohexyl methyl methylphosphonate 화학적 특성, 용도, 생산

• 용도

  Cyclohexyl methyl methylphosphonate or phosphonic acid is used as a micro-nano electronic materials have extended self-assembled monolayers (SAMs) beyond conventional gold/thiol systems. To expand the choice of the substrate used for the preparation of SAMs, the chemical functionalities in film-forming molecules can be altered by introducing phosphate or phosphonate groups. Such polar acidic molecules are capable of interacting with diverse metal-oxide surfaces (e.g., Al2O3, Ta2O5, NbO5, ZrO2 and TiO2) and form films with a similar degree of ordering as for alkyl thiol SAMs on gold.

Cyclohexyl methyl methylphosphonate 공급 업체

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