시스-데카히드로퀴놀린

그림문자(GHS)

• 그림문자(GHS)

  

• 신호 어

  Warning

• 유해·위험 문구

  H315：피부에 자극을 일으킴

  H319：눈에 심한 자극을 일으킴

  H335：호흡 자극성을 일으킬 수 있음

• 예방조치문구

  P264：취급 후에는 손을 철저히 씻으시오.

  P264：취급 후에는 손을 철저히 씻으시오.

  P280：보호장갑/보호의/보안경/안면보호구를 착용하시오.

  P302+P352：피부에 묻으면 다량의 물로 씻으시오.

  P305+P351+P338：눈에 묻으면 몇 분간 물로 조심해서 씻으시오. 가능하면 콘택트렌즈를 제거하시오. 계속 씻으시오.

  P321：(…) 처치를 하시오.

  P332+P313：피부 자극이 생기면 의학적인 조치· 조언을 구하시오.

  P362：오염된 의복을 벗고 세척 후에 재사용하기

시스-데카히드로퀴놀린 화학적 특성, 용도, 생산

• Purification Methods

  It is available as a cis-trans-mixture (b 70-73o/10mm, Aldrich, ~ 18% cis-isomer [2051-28-7]), but the isomers can be separated by fractionating in a spinning band column (1~1.5 metre, type E) at atmospheric pressure and collecting 2mL fractions with a distillation rate of 1 drop in 8-10seconds. The lower boiling fraction solidifies and contains the trans-isomer (see below, m 48o). The higher boiling fraction b 207-208o/708mm remains liquid and is mostly pure cis-isomer. This is reacted with PhCOCl and M aqueous NaOH to yield the N-benzoyl derivative m 96o after recrystallisation from pet ether (b 80-100o). It is hydrolysed with 20% aqueous HCl by refluxing overnight. PhCO2H is filtered off, the filtrate is basified with 5M aqueous NaOH and extracted with Et2O. The dried extract (Na2SO4) is saturated with dry HCl gas, and the cis-decahydroquinoline hydrochloride which separates has m 222-224o after washing with Et2O and drying at 100o; and has IR (KBr) 2900, max 2780, 2560, 1580, 1445, 1432, 1403, 1165, 1080, 1036, 990, 867 cm -1. The free base is obtained by dissolving the hydrochloride salt in 5M aqueous NaOH, extracting with Et2O and drying the extract (Na2SO4), evaporating and distilling the residue; it has IR (film) 2900, 2840, 2770, 1445, 1357, 1330, 1305, 1140, max 1125, 1109, 1068, 844 cm-1 . The 1H NMR in CDCl3 is characteristically different from that of the trans-isomer. [Armarego J Chem Soc (C) 377 1967, Hückel & Stepf Justus Liebigs Ann Chem 453 163 1927, Bailey & McElvain J Am Chem Soc 52 4013 1930, Beilstein 20 H 157, 20 I 35, 20 II 72-73, 20 III/IV 2017.]

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