12018-09-6

Einecs 234-633-0 Chromium silicon CHROMIUM SILICIDE Chromium disilicon Cr3Sipowder-325mesh CHROMIUM DISILICIDE Chromium silicide(CrSi2) Chromium silicide,(99+% Cr) Chromium Silicide, -325 Mesh Chromiumsilicide(metalsbasis) Chromiumsilicidemeshgraypowder CHROMIUM SILICIDE, -230 MESH, 99+% CHROMIUM SILICIDE ISO 9001：2015 REACH Chromium silicide, 99+% (metals basis) Calcium Fluoride (CaF2) Infrared Crystal Chromium Disilicide (Average Particle Size 2～5μm) Chromium silicide sputtering target, 76.2mm (3.0 in.) dia. x 6.35mm (0.250 in.) thick Chromium silicide sputtering target, 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick Chromium silicide sputtering target, 50.8mm (2.0 in.) dia. x 3.18mm (0.125 in.) thick CrSi2 Sputtering Target: 200mm dia. x 6mm thick: 99,5% (metals basis): hot pressed Chromium silicide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basi Chromium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basi Chromium silicide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basi Chromium silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basi Chromium silicide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis) Chromium silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis) Chromium silicide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis) Chromium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)