Used as an intermediate in organic synthesis.
Tert-Butyl 4-Vinylphenyl Carbonate (tBVPC) could be used to synthesize a terpolymer, which is a novel chemically amplified positive photoresist with methyl methacrylate (MMA)triphenylsulfonium salt methacrylate (TPSMA). In addition, Lithographic performance of a PAG-bound polymer resist based on tert-butyl 4-vinyl phenyl carbonate, n-[p-(t-butyloxycarbonyloxy) phenyl]maleimide terpolymers as a novel chemically amplified resist exhibited a positive working behavior. They showed 0.18 μm line pattern at electron beam lithography to indicate that the polymer bounded PAG resists have a potential to fabricate nanostructures[1].
Moderately toxic by skin contact. A mild
skin irritant.
Tert-Butyl 4-Vinylphenyl Carbonate was prepared by reacting 4-Hydroxystyrene with Di-tert-butyl dicarbonate in prestence of Tetramethylammonium hydroxide in water.
[1] Jae Beom Yoo . “Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography.” Polymer 55 16 (2014): Pages 3599-3604.
