Diethylsilane is a reagent used in the chemical vapor deposition of SiO2 for microelectronics. It is also used as a precursor to prepare (3-allylsulfanyl-propyl)-diethyl-silane by using (Ph3P)3RhCl as reagent. It can also be used as a reductant in catalytic reduction of secondary amides to imines and secondary amines has been achieved using readily available iridium catalysts such as [Ir(COE)2Cl]2. This system requires low catalyst loading and shows high efficiency and an appreciable level of functional group tolerance. As a reduction agent, it also be used to convert polycarboxylic acids into their corresponding alkanes.
Levy, R. A., J. M. Grow, and G. S. Chakravarthy. "Low-pressure chemical vapor deposition of silicon dioxide using diethylsilane." Cheminform 24.28(1993):851-854.
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https://pubs.acs.org/doi/full/10.1021/ja304547s#citing
Nimmagadda, Rama D., and C. Mcrae. Cheminform 37.35(2006):3505-3508.
Diethylsilane is used as a precursor to prepare (3-allylsulfanyl-propyl)-diethyl-silane by using (Ph3P)3RhCl as reagent. It is also used in the chemical vapor deposition of SiO2 for microelectronics.
Used in the ‘in-situ’ preparation of diborane and haloboranes.
