Triethylsilane is a kind of tetra-alkylsilicon hydride. It can be used as the intermediates of OLED, pharmaceuticals. It can also be used as safe organosilane sources for the chemical vapor deposition of SiC films.
Kubo, Naoki, et al. "Epitaxial Growth of 3C-SiC on Si(111) Using Hexamethyldisilane and Tetraethylsilane." Japanese Journal of Applied Physics 43.11A (2004):7654.
Used as the intermediates of OLED, pharmaceuticals.
Fractionate it through a 3ft vacuum-jacketted column packed with 1/4" stainless steel saddles. The material is finally percolated through a 2ft column packed with alumina and maintained in an inert atmosphere. [Staveley et al. J Chem Soc 1992 1954, Altshaller & Rosenblum J Am Chem Soc 77 272 1955, Beilstein 4 H 625.]
