Titanium diboride (TiB2) a gray hexagonal crystal and It is a ceramic material with high hardness and strength, good thermal shock resistance, low resistance, and not easy to be corroded by molten metal.
Gray crystals, superconducting
at 1.26 K. High-temperature
electrical conductor, used as
crucible material for handling
molten metals such as Al, Zn, Cd,
Bi, Sn, and Rb; strongly corroded
by liquid metals such as Ti, Zr, V,
Nb, Ta, Cr, Mn, Fe, Co, Ni, and
Cu. Begins to be oxidized in air
above 1100–1400°C. Corrosion
resistance in hot concentrated
brines. Maximum operating
temperature 1000°C (reducing)
and 800°C (oxidizing).
Titanium boride is used in seals wear parts and cutting tools. It is used to make ballistic armour due to its high hardness. It is used to constitute composite materials in which the presence of the material serves to increase strength and fracture toughness of the matrix.
Titanium diboride is a conductive composite material. Making conductive boron nitride (evaporation boat) with Titanium boride (TiB2) and boron nitride (BN) is the main component of vacuum aluminum plating equipment. It can also be used as an important component of multi-component composite materials. Titanium boride can be combined with TiC, TiN, SiC and other materials to form composite materials for cutting tools. It can also be used as a component to make armor protection materials. The best material for components and functional devices. TiB2 is used to metallurgical additive, high-temperature electrical conductor, refractory, cermet component, coatings resistant to attack by molten metals, aluminum manufacture, super alloys.Used as a cathode material in aluminum smelting and can be shaped by electrical discharge machining. Specialized applications in such areas as impact resistant armor, cutting tools, crucibles, neutron absorbers and wear resistant coatings.
Synthesis of titanium diboride through reduction of titanium dioxide by boron carbide and carbon, and its reaction equation
2TiO2+B4C+3C=2TiB2+4CO
Vapor Deposition
Using TiCl4 and BCl3 as raw materials, with the participation of H2, the deposition temperature is 800 ~ 1000 ℃, abrasive-grade and electronic-grade products can be obtained. The reaction equation
TiCl4+2BCl3+5H2=TiB2+10HCl
