1,3-Bis(Chloromethyl)-1,1,3,3-Tetramethyldisiloxane is an adhesive-repellent polymeric material used in the production of silicon release papers and film release coatings.
As a new type of material, 1,3-Bis(Chloromethyl)-1,1,3,3-Tetramethyldisiloxane has excellent properties such as high and low temperature resistance, weather resistance, aging resistance, electrical insulation, ozone resistance, hydrophobicity, flame retardancy and biological inertness. It has been widely used in aerospace, electrical and electronic, construction, environment , energy and biomedical fields.
The synthesis methods of 1,3-Bis(Chloromethyl)-1,1,3,3-Tetramethyldisiloxane mainly include direct synthesis method, hydrosilylation method, hydrolysis condensation method and organometallic method.
