1H-벤조트라이아졸카복실산

그림문자(GHS)

• 그림문자(GHS)

  

• 신호 어

  Warning

• 유해·위험 문구

  H315：피부에 자극을 일으킴

  H319：눈에 심한 자극을 일으킴

  H335：호흡 자극성을 일으킬 수 있음

• 예방조치문구

  P264：취급 후에는 손을 철저히 씻으시오.

  P264：취급 후에는 손을 철저히 씻으시오.

  P280：보호장갑/보호의/보안경/안면보호구를 착용하시오.

  P302+P352：피부에 묻으면 다량의 물로 씻으시오.

  P305+P351+P338：눈에 묻으면 몇 분간 물로 조심해서 씻으시오. 가능하면 콘택트렌즈를 제거하시오. 계속 씻으시오.

  P321：(…) 처치를 하시오.

  P332+P313：피부 자극이 생기면 의학적인 조치· 조언을 구하시오.

  P362：오염된 의복을 벗고 세척 후에 재사용하기

1H-벤조트라이아졸카복실산 화학적 특성, 용도, 생산

• 용도

  Used as an intermediate for organic synthesis.

• Synthesis

  1H-Benzotriazole-5-carboxylic acid was formed of carboxytriazole (3.91 g, 24 mmol), 4-dimethylaminopyridine (0.32 g, 2.6 mmol), dimethylformamide (58 g) andatert-butyl methyl ether (46 g) solution of ZTETRAOL 2000s produced by the SOLVAY SOLEXIS company (Mn of 1730 for Rf(F)=-CF2O (CF2CF2O)m(CF2O)nCF2-) (13.26 g, 6.0 mmol) which had four terminal hydroxyl groups, as a perfluoropolyether were added sequentially to a three-necked flask which had been fitted with a nitrogen bubbling tube and a stirrer. 1-Ethy3- (3-dimethylaminopropyl)carboxylmide hydrochloride (4.60 g, 24 mmol) was added at room temperature and stirred for 24 hours at 50°C. Water (60 g) and methyl isobutyl ketone (60 g) were added to the reaction solution and the liquid was partitioned. The organic layer was washed two or three times with 1% hydrochloric acid aqueous solution (50 g) and saturated salt water (50 g) and then dried with anhydrous sodium sulphate and concentrated and 1H-Benzotriazole-5-carboxylic acid was obtained. Yield (10.1 g).

1H-벤조트라이아졸카복실산 공급 업체

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